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High Vacuum Magnetron Sputtering Gun 3 inch with 90 Angle

C90SpinTron 3: 3" high vacuum magnetron sputtering gun with 90 degree angle.


Product Code: C90SpinTron 3

1 in stock




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Description
The C90SpinTron 3 is a 3-inch diameter circular magnetron sputtering gun with 90 degree angle. It can accommodate a wide range of sputtering targets, metallic or insulating, magnetic or non-magnetic. The internal magnetic configuration utilizing a circular rare-earth NdFeB permanent magnet enables excellent film uniformity and target utilization. It is easy to install, to operate, and to maintain. The quality construction provides long-term operation. The shock-absorbing packaging design allows secure shipping and storage.
Features
  • Quality construction: The SpinTron series of sputtering guns was designed and manufactured with a focus on details. We use high quality materials of stainless steel and ceramics. The design and selection of components and materials are based on the principles of physics and engineering.
  • Enhancement from magnetic assembly: We have used electromagnetic finite element calculations in the design of the permanent magnetic assembly to achieve high field strength and uniform field profile. We use NdFeB rare-earth permanent magnet in every SpinTron product, and offer a true magnetron sputtering tool. The magnet is coated with multiple layers of protective materials against cooling-water induced corrosion for durability.
  • Strong coupling with external power:The SpinTron is equipped with a standard electrical RF connector, which matches physically and electronically with a wide range of DC and RF sputtering power supplies. The low impedance sputtering heads are easily interfacible with external power supply.
  • Easy installation and adjustment: The SpinTron can be installed very easily with a standard fitting without the use of special tools. Its position in the vacuum chamber can be adjusted conveniently.
  • Easy target change: Change of target is as easy as "123" by firstly placing the target on the anode, then putting on the target cover, and finally, adding on the anode shield. There is no need to adjust the gun to fit targets with different height.
  • Versatile sizes: The SpinTron Series consists of 1, 2, 3, 4-inch diameter sputtering heads. Other diameters can be custom made with similar performance as the standard offerings.
  • Easy maintenance: The SpinTron is easy to maintain and designed to have a long life time.
  • Customer centered services: We warrantee our products against defective parts and poor workmanship. We strive to minimize down-time for the products. We are so confident about the SpinTron that we will provide a loaner for a SpinTron under repair, so that the disruption to your business is minimized.
Applications

The SpinTron magnetron guns can be used to fabricate a wide range of films. Some of the applications are listed below.

  Film coating

  Semiconductor devices

  Spintronic devices

  Magnetic recording media

  Superconducting films

  Quantum computing devices

  MEMS

  Biosensors

  Nanotechnology

  Superlattices

  Granular films

  Shape memory alloys

  Combinatorial thin film deposition

  Thin film based lasers

Technical Specification

Sputtering Target

 

 

Diameter

3.0" (76.2mm)

 

Thickness

to 1/4" for non-magnetic target

 

 

to 1/16" for magnetic target

 

Utilization

up to 30%

 

Magnet

NdFeB Rare Earth Magnet

 

 

 

Power

 

 

DC (Max.)

1200 W

 

RF (Max.)

  800 W

 

Sputtering Current (Max.)

3 Amp

 

Sputtering Voltage

100-1000 V

 

Sputtering Pressure

.5-100 mTorr

 

 

 

Cooling Water

 

 

Flow Rate

1  GPM

 

Water Inlet Temperature

<20 C

 

Water tubing

0.25" O.D.

Mounting

 

 

Feedthrough

1" O.D.tube

 

Electrical Connector

Standard HN type (DC and RF)

 

 

 

Dimension and Weight

 

 

Anode Shield Diameter

4.75"

 

 

Weight

12 lbs

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