Home mmi logo My Account -- Access Account InformationOrder Status -- Check the Status of an OrderShopping Basket -- View the Contents of Your Shopping BasketHelp Button -- Link to the Help Pages  
 Home   Products   Publications   Knowledge   News   About Us   Contact Us 
 
Magnetic Current Imaging
Magnetic Anti-Counterfeiting
Magnetron Sputter Sources
Plasma Cleaning Systems
Magnetic Thermal Annealing
Vacuum Deposition Systems
Ion Beam Etching Systems
Accessories
Gaussmeters / Magnetometers
Electromagnet Systems
Scanning Magnetic Microscope
Helmholtz Coils and Controller
Noise Spectrum Analyzer
DirectVacuum News

 
 
 
 
SpinTron Option: SpinTron-GI Gas Injection Ring

Gas injection ring option for SpinTron Series high vacuum magnetron sputter sources.

Product Code: SpinTron-GI

1 in stock




Write Review | Read Reviews

Tell a Friend about this product

Description
The Local Gas Injection Ring introduces the sputtering gas to the vicinity of the sputtering target. In magnetron sputtering, the plasma is localized near the surface of the sputtering target. The Gas Injection Ring directly brings the sputtering gas to the plasma area. The smaller gas concentration near the substrate improves the dynamics of the sputtered atoms. Also, the Injection Ring minimizes the interaction between the sputtering gas and the deposited film. 
Features

 

Applications

 

Technical Specification

 

Search
Go
Your Cart
 Checkout
Customer Login
Email
Password

Start as new user

Forgot your password?