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SpinTron Option: SpinTron-GI Gas Injection Ring

Gas injection ring option for SpinTron Series high vacuum magnetron sputter sources.

Product Code: SpinTron-GI

1 in stock

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The Local Gas Injection Ring introduces the sputtering gas to the vicinity of the sputtering target. In magnetron sputtering, the plasma is localized near the surface of the sputtering target. The Gas Injection Ring directly brings the sputtering gas to the plasma area. The smaller gas concentration near the substrate improves the dynamics of the sputtered atoms. Also, the Injection Ring minimizes the interaction between the sputtering gas and the deposited film. 




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