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High Vacuum Magnetron Sputter Source 4 inch

SpinTron 4: 4-inch diameter high vacuum magnetron sputtering gun.
 
 

Product Code: SpinTron 4

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Description
The SpinTron4 is a circular magnetron sputtering gun with a 4-inch diameter. It can accommodate a wide range of sputtering targets, metallic or insulating, magnetic or non-magnetic. The internal magnetic configuration utilizing a circular rare-earth NdFeB permanent magnet enables excellent film uniformity and target utilization. The SpinTron4 is easy to install, to operate, and to maintain. Its quality construction provides long-term operation, and its shock-absorbing packaging design allows secure shipping and storage.
Features
  • Quality construction: The SpinTron series of sputtering guns was designed and manufactured with a focus on details. We use high quality materials of stainless steel and ceramics. The design and selection of components and materials are based on the principles of physics and engineering.
  • Enhancement from magnetic assembly: We have used electromagnetic finite element calculations in the design of the permanent magnetic assembly to achieve high field strength and uniform field profile. We use NdFeB rare-earth permanent magnets in every SpinTron product and offer a top-of-the-line magnetron sputtering tool. The magnet is coated with multiple layers of protective material against cooling-water induced corrosion to maximize durability.
  • Strong coupling with external power:The SpinTron is equipped with a standard electrical RF connector, which matches physically and electronically with a wide range of DC and RF sputtering power supplies. The low impedance sputtering heads are easily interfacible with an external power supply.
  • Easy installation and adjustment: The SpinTron can be installed very easily with a standard fitting without the use of special tools. Its position in the vacuum chamber can be adjusted conveniently.
  • Easy target change: Change of target is as easy as "123" by first placing the target on the anode, then putting on the target cover, and finally, adding on the anode shield. There is no need to adjust the gun to fit targets with different height.
  • Versatile sizes: The SpinTron Series consists of 1, 2, 3, and 4-inch diameter sputtering heads. Other diameters can be custom made with similar performance as the standard offerings.
  • Easy maintenance: The SpinTron is easy to maintain and designed to have a long life time.
  • Customer centered services: We guarantee our products against defective parts and poor workmanship and strive to minimize down-time for the products. We are so confident about the SpinTron that we will provide a loaner for a SpinTron under repair, so that the disruption to your business is minimized.
Applications

The SpinTron magnetron guns can be used to fabricate a wide range of films. Some of the applications are listed below,

  • Film coating
  • Semiconductor devices
  • Spintronic devices
  • Magnetic recording media
  • Superconducting films
  • Quantum computing devices
  • MEMS
  • Biosensors
  • Nanotechnology
  • Superlattices
  • Granular films
  • Shape memory alloys
  • Combinatorial thin film deposition
  • Thin film based lasers 
  • Technical Specification

     PHYSICAL/PROCESS    Min.    Typical    Max.    Unit  
      Sputtering Power, DC      2000    2300    W  
      Sputtering Power, RF      700    1000    W  
      Operating Pressure    3    5    50    mTorr  
      Operating Temperature    10      100    ?C  
             
     TARGET          
     Target Diameter      4      inch  
     Target Thickness        1/8    inch  
     (Non-Magnetic)          
     Target Thickness (Magnetic)        1/16    inch  
     Target Utilization       30   %  
             
     COOLING WATER          
      Flow Rate      2.0    2.2    GPM  
      Input Temperature        20    ?C  
      Pressure, open drain        50    Psig  

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